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ICP-OES 2000R

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ICP-OES 2000R

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Product Details

The ICP-OES 2000R is a high-performance Inductively Coupled Plasma Optical Emission Spectrometer engineered for rapid, reliable and precise multi-element analysis.

Built around a simultaneous dual-view plasma configuration and a high-resolution Echelle optical system, the instrument is designed to support the demanding throughput and data-quality requirements of modern analytical laboratories.

Advanced ICP-OES for Reliable Multi-Element Analysis

The ICP-OES 2000R provides simultaneous axial and radial plasma observation for a wide working range across sample types. Its Echelle-based optical system provides high dispersion and fine spectral resolution across the working range.

The solid-state CCD detector provides full-wavelength coverage for simultaneous multi-element measurement. The system covers a spectral range of 160–900 nm.

The instrument includes automated plasma ignition and control with an integrated plasma-observation camera. It also supports a high-capacity autosampler for extended analytical runs.

Key System Highlights

  • Simultaneous Axial + Radial Plasma Viewing
  • Echelle Optical System
  • Solid-State CCD Detector
  • 160–900 nm Spectral Range
  • Adjustable RF Power from 400–1800 W
  • Automated Plasma Control
  • Integrated Plasma Observation Camera
  • 250-Sample Autosampler

Main Features

Simultaneous Dual View

Simultaneous axial and radial plasma observation provides a wide working range across different sample types.

Echelle Optical System

High-dispersion Echelle-based polychromator delivers fine spectral resolution across the working range.

Solid-State CCD Detector

Full-wavelength-coverage solid-state detection supports simultaneous multi-element measurement.

Wide Spectral Coverage

The 160–900 nm spectral range provides access to a broad library of emission wavelengths.

Automated Plasma Control

Fully automated plasma ignition and control with an integrated plasma-observation camera.

High-Capacity Autosampler

Supports unattended operation with a high-capacity sample tray for extended analytical runs.

Advanced RF System

Free-running solid-state RF generator with 40 MHz RF frequency and adjustable RF power from 400–1800 W.

Automated Gas Flow Control

Mass Flow Controllers manage gas flow with three independent gas ports.

Laboratory Operation

Operating temperature is 15–35°C ambient, with argon consumption of 12 L per minute and a warm-up time of 7 minutes.

Technical Specifications

Parameter Specification
System Configuration High-performance simultaneous synchronous dual-view ICP-OES
Plasma Viewing Simultaneous synchronous Axial + Radial view
Optical System Echelle-based optics
Detector Solid-state CCD
Pixel Size 25µm × 25µm
Spectral Range 160–900 nm
Polychromator Echelle, >90 lines/mm
Focal Length 250–280 mm
Radial Height Adjustment Adjustable
RF Generator Free-running solid-state
RF Frequency 40 MHz
RF Power Adjustable 400–1800 W
RF Increment 5 W
Optical Resolution ≤0.006 nm at 200 nm
Wavelength Capability >30,000 emission wavelengths
Integration Time ≤1 second
Dimensions 100 × 60 × 70 cm
Weight 200 Kg
Autosampler 250 samples
Corrosion Resistance Acid and alkaline resistance
Plasma Control Fully automated
Plasma Observation Integrated camera
Gas Flow Control Mass Flow Controllers
Gas Connections 3 independent gas ports
Operating Temperature 15–35°C ambient
Argon Consumption 12 L per minute
Warm-up Time 7 minutes
Plasma Gas 8–20 L/min
Auxiliary Gas 0–2 L/min
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