Product Details
The ICP-OES 2000R is a high-performance Inductively Coupled Plasma Optical Emission Spectrometer engineered for rapid, reliable and precise multi-element analysis.
Built around a simultaneous dual-view plasma configuration and a high-resolution Echelle optical system, the instrument is designed to support the demanding throughput and data-quality requirements of modern analytical laboratories.
Advanced ICP-OES for Reliable Multi-Element Analysis
The ICP-OES 2000R provides simultaneous axial and radial plasma observation for a wide working range across sample types. Its Echelle-based optical system provides high dispersion and fine spectral resolution across the working range.
The solid-state CCD detector provides full-wavelength coverage for simultaneous multi-element measurement. The system covers a spectral range of 160–900 nm.
The instrument includes automated plasma ignition and control with an integrated plasma-observation camera. It also supports a high-capacity autosampler for extended analytical runs.
Key System Highlights
- Simultaneous Axial + Radial Plasma Viewing
- Echelle Optical System
- Solid-State CCD Detector
- 160–900 nm Spectral Range
- Adjustable RF Power from 400–1800 W
- Automated Plasma Control
- Integrated Plasma Observation Camera
- 250-Sample Autosampler
Main Features
Simultaneous Dual View
Simultaneous axial and radial plasma observation provides a wide working range across different sample types.
Echelle Optical System
High-dispersion Echelle-based polychromator delivers fine spectral resolution across the working range.
Solid-State CCD Detector
Full-wavelength-coverage solid-state detection supports simultaneous multi-element measurement.
Wide Spectral Coverage
The 160–900 nm spectral range provides access to a broad library of emission wavelengths.
Automated Plasma Control
Fully automated plasma ignition and control with an integrated plasma-observation camera.
High-Capacity Autosampler
Supports unattended operation with a high-capacity sample tray for extended analytical runs.
Advanced RF System
Free-running solid-state RF generator with 40 MHz RF frequency and adjustable RF power from 400–1800 W.
Automated Gas Flow Control
Mass Flow Controllers manage gas flow with three independent gas ports.
Laboratory Operation
Operating temperature is 15–35°C ambient, with argon consumption of 12 L per minute and a warm-up time of 7 minutes.
Technical Specifications
| Parameter | Specification |
|---|---|
| System Configuration | High-performance simultaneous synchronous dual-view ICP-OES |
| Plasma Viewing | Simultaneous synchronous Axial + Radial view |
| Optical System | Echelle-based optics |
| Detector | Solid-state CCD |
| Pixel Size | 25µm × 25µm |
| Spectral Range | 160–900 nm |
| Polychromator | Echelle, >90 lines/mm |
| Focal Length | 250–280 mm |
| Radial Height Adjustment | Adjustable |
| RF Generator | Free-running solid-state |
| RF Frequency | 40 MHz |
| RF Power | Adjustable 400–1800 W |
| RF Increment | 5 W |
| Optical Resolution | ≤0.006 nm at 200 nm |
| Wavelength Capability | >30,000 emission wavelengths |
| Integration Time | ≤1 second |
| Dimensions | 100 × 60 × 70 cm |
| Weight | 200 Kg |
| Autosampler | 250 samples |
| Corrosion Resistance | Acid and alkaline resistance |
| Plasma Control | Fully automated |
| Plasma Observation | Integrated camera |
| Gas Flow Control | Mass Flow Controllers |
| Gas Connections | 3 independent gas ports |
| Operating Temperature | 15–35°C ambient |
| Argon Consumption | 12 L per minute |
| Warm-up Time | 7 minutes |
| Plasma Gas | 8–20 L/min |
| Auxiliary Gas | 0–2 L/min |
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